7 Patents
- US123425992025Manufacturing Method of Semiconductor Device Including Gate Oxide Layer
UNITED MICROELECTRONICS Corp.
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- US120574832024Semiconductor Device Including Gate Oxide Layer and Manufacturing Method Thereof
UNITED MICROELECTRONICS Corp.
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- US117372572023Semiconductor Device and Manufacturing Method Thereof
Fujian Jinhua Integrated Circuit Co., Ltd.
0 cites - US116265002023Semiconductor Device Including Gate Oxide Layer and Manufacturing Method Thereof
UNITED MICROELECTRONICS Corp.
0 cites