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Inventors
Yu-chung Su
Hsinchu
TW
6 patents
4 Patents
US12578640
2026
Photosensitive Material for Photoresist and Lithography
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US12547075
2026
Method of Forming Photoresist Pattern
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US12535739
2026
Method of Forming Photoresist Pattern
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US12087616
2024
Air Gap Formation Method
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites