Patents/Inventors

Yongmyung Jun

Hwaseong-siKR1 patent

2 Patents

US123622002025
Supercritical Fluid Processing Apparatus and Substrate Processing System Including the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites
US121911902025
Substrate Processing Chamber, Substrate Processing System Including the Same, and Substrate Processing Method Using the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites