Patents/Inventors

Yoel Feler

HaifaIL16 patents

15 Patents

US125608712026
Metrology Target for Scanning Metrology
KLA Corporation
0 cites
US125108312025
Robust and Accurate Overlay Target Design for CMP
KLA Corporation
0 cites
US123477062025
Method for Measuring and Correcting Misregistration Between Layers in a Semiconductor Device, and Misregistration Targets Useful Therein
KLA-TENCOR CORPORATION
0 cites
US122042542025
Multi-layered Moiré Targets and Methods for Using the Same in Measuring Misregistration of Semiconductor Devices
KLA CORPORATION
0 cites
US121054332024
Imaging Overlay Targets Using Moiré Elements and Rotational Symmetry Arrangements
KLA Corporation
0 cites
US120941002024
Measurement of Stitching Error Using Split Targets
KLA Corporation
0 cites
US120558592024
Overlay Mark Design for Electron Beam Overlay
0 cites
US120136342024
Reduction or Elimination of Pattern Placement Error in Metrology Measurements
KLA-TENCOR CORPORATION
0 cites
US118625222024
Accuracy Improvements in Optical Metrology
0 cites
US118625242024
Overlay Mark Design for Electron Beam Overlay
0 cites
US117748632023
Induced Displacements for Improved Overlay Error Metrology
KLA CORPORATION
0 cites
US117200312023
Overlay Design for Electron Beam and Scatterometry Overlay Measurements
KLA Corporation
0 cites
US116865762023
Metrology Target for One-dimensional Measurement of Periodic Misregistration
KLA Corporation
0 cites
US116146922023
Self-moire Grating Design for Use in Metrology
KLA Corporation
0 cites
US116041492023
Metrology Methods and Optical Schemes for Measurement of Misregistration by Using Hatched Target Designs
KLA Corporation
0 cites