Yi-chia Lee

7 Patents

• US122986692025

  Composition Comprising Three Alkanolamines and a Hydroxylamine for Removing Etch Residues

  Versum Materials US, LLC

  0 cites
• US122812512025

  Etching Composition and Method for Selectively Removing Silicon Nitride During Manufacture of a Semiconductor Device

  Versum Materials US, LLC

  0 cites
• US121104352024

  Etching Composition and Method for Selectively Removing Silicon Nitride During Manufacture of a Semiconductor Device

  Versum Materials US, LLC

  0 cites
• US121104362024

  Co/cu Selective Wet Etchant

  Versum Materials US, LLC

  0 cites
• US119553412024

  Etching Solution and Method for Selectively Removing Silicon Nitride During Manufacture of a Semiconductor Device

  Versum Materials US, LLC

  0 cites
• US119461482024

  Hafnium Oxide Corrosion Inhibitor

  Versum Materials US, LLC

  0 cites
• US119292572024

  Etching Solution and Method for Aluminum Nitride

  Versum Materials US, LLC

  0 cites