32 Patents
- US125572582026Semiconductor Device and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US124396232025Field Effect Transistors with Dual Silicide Contact Structures
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US124314122025Contact Plugs for Semiconductor Device and Method of Forming Same
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US124083162025Memory Array Circuit and Method of Manufacturing Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US123242202025Semiconductor Structure and Method for Manufacturing the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY Ltd.
0 cites - 0 cites
- US122666882025Semiconductor Device with Source/drain Contact Formed Using Bottom-up Deposition
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US122667092025Selective Dual Silicide Formation Using a Maskless Fabrication Process Flow
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - 0 cites
- US120657462024Substrate Processing Method and Substrate Processing Apparatus
SCREEN Holdings Co., Ltd.
0 cites - US120684142024Interface Profile Control in Epitaxial Structures for Semiconductor Devices
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US120273722024Contact Structures with Deposited Silicide Layers
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US120290232024Memory Array Circuit and Method of Manufacturing Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - 0 cites
- US119844502024Semiconductor Device Having Spacer Residue
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US119569382024Semiconductor Device and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - 0 cites
- US118551772023Field Effect Transistors with Dual Silicide Contact Structures
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US118238962023Conductive Structure Formed by Cyclic Chemical Vapor Deposition
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - 0 cites
- US117568642023Contact Plugs for Semiconductor Device
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US117496822023Selective Dual Silicide Formation Using a Maskless Fabrication Process Flow
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US117422482023Semiconductor Device and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - 0 cites
- US117284142023Semiconductor Device Including a Fin-fet and Method of Manufacturing the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US117157632023Method of Forming Metal Contact for Semiconductor Device
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US116825882023Epitaxial Source/drain and Methods of Forming Same
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US116371082023Memory Array Circuit and Method of Manufacturing Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - 0 cites
- 0 cites
- US115574842023Contact Structures with Deposited Silicide Layers
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US115454292023Interconnect Structures Having Lines and Vias Comprising Different Conductive Materials
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites