Patents/Inventors

Yasuharu Sasaki

MiyagiJP19 patents

21 Patents

US122939032025
Substrate Support and Plasma Processing Apparatus
Tokyo Electron Limited
0 cites
US122887132025
Mounting Table and Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US122725282025
Stage and Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US121658962024
Substrate Support and Substrate Processing Apparatus
Tokyo Electron Limited
0 cites
US120464572024
Electrostatic Chuck, Focus Ring, Support Base, Plasma Processing Apparatus, and Plasma Processing Method
Tokyo Electron Limited
0 cites
US120338862024
Plasma Processing Apparatus and Method for Manufacturing Mounting Stage
Tokyo Electron Limited
0 cites
US119843002024
Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US119357292024
Substrate Support and Plasma Processing Apparatus
Tokyo Electron Limited
0 cites
US119231712024
Plasma Processing Apparatus and Plasma Processing Method
Tokyo Electron Limited
0 cites
US119086662024
Stage and Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US118942182024
Electrostatic Chuck, Support Platform, and Plasma Processing Apparatus
Tokyo Electron Limited
0 cites
USD10120512024
Electrostatic Chuck for Semiconductor Manufacturing Device
TOKYO ELECTRON LIMITED
0 cites
US118307512023
Plasma Processing Apparatus and Plasma Processing Method
TOKYO ELECTRON LIMITED
0 cites
US117987912023
Substrate Support and Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US117911392023
Substrate Support
Tokyo Electron Limited
0 cites
US117640382023
Plasma Processing Apparatus, Electrostatic Attraction Method, and Electrostatic Attraction Program
TOKYO ELECTRON LIMITED
0 cites
USD09926142023
Focus Ring
Tokyo Electron Limited
0 cites
USD09926152023
Focus Ring
Tokyo Electron Limited
0 cites
US116885872023
Substrate Support Assembly, Plasma Processing Apparatus, and Plasma Processing Method
TOKYO ELECTRON LIMITED
0 cites
US116642002023
Placing Table, Positioning Method of Edge Ring and Substrate Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US116004712023
Substrate Support, Plasma Processing Apparatus, and Focus Ring
TOKYO ELECTRON LIMITED
0 cites