Patents/Inventors

Yang-shan Huang

VeldhovenNL2 patents

3 Patents

US123325702025
Lithographic System Provided with a Deflection Apparatus for Changing a Trajectory of Particulate Debris
ASML Netherlands B.V.
0 cites
US120322962024
Fluid Handling System, Method and Lithographic Apparatus
ASML NETHERLANDS B.V.
0 cites
US119616982024
Replaceable Module for a Charged Particle Apparatus
ASML Netherlands B.V.
0 cites