6 Patents
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- US122179352025Plasma Processing Methods Using Multiphase Multifrequency Bias Pulses
Tokyo Electron Limited
0 cites - US120401762024Technologies for High Aspect Ratio Carbon Etching with Inserted Charge Dissipation Layer
Tokyo Electron Limited
0 cites - US120092112024Method for Highly Anisotropic Etching of Titanium Oxide Spacer Using Selective Top-deposition
Tokyo Electron Limited
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