12 Patents
- US125819252026Selective Metal Cap in an Interconnect Structure
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US123681032025Diffusion Barrier Layer for Conductive via to Decrease Contact Resistance
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US123549582025Semiconductor Devices and Methods of Formation
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - 0 cites
- US120681942024Selective Deposition of Metal Barrier in Damascene Processes
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - 0 cites
- US119086972024Interconnect Structure Having a Carbon-containing Barrier Layer
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
0 cites - US118517492023Semiconductor Device, Method and Machine of Manufacture
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US118375002023Selective Deposition of Metal Barrier in Damascene Processes and the Structures Formed Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - 0 cites
- US117422912023Diffusion Barrier Layer for Conductive via to Decrease Contact Resistance
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US116768982023Diffusion Barrier for Semiconductor Device and Method
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites