3 Patents
- US124531542025Dielectric Constant Reduction of Gate Spacer
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US120627072024Method of Manufacturing a Field Effect Transistor by Tilted Implantation of Dopants Into Inner Sidewalls of Gate Spacers
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US116886472023Semiconductor Device and Method for Manufacturing the Same
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites