Patents/Inventors

Xingyue Peng

San Jose, CAUS4 patents

4 Patents

US122226562025
Method for Determining Aberration Sensitivity of Patterns
ASML NETHERLANDS B.V.
0 cites
US122102912025
Aberration Impact Systems, Models, and Manufacturing Processes
ASML NETHERLANDS B.V.
0 cites
US120929632024
Method of Determining Characteristic of Patterning Process Based on Defect for Reducing Hotspot
ASML NETHERLANDS B.V.
0 cites
US118993742024
Method for Determining an Electromagnetic Field Associated with a Computational Lithography Mask Model
ASML Netherlands B.V.
0 cites