Xiaoquan Min

5 Patents

• US121911152025

  Dual RF for Controllable Film Deposition

  Applied Materials, Inc.

  0 cites
• US120625362024

  Amorphous Carbon for Gap Fill

  Applied Materials, Inc.

  0 cites
• US120273662024

  Reduced Hydrogen Deposition Processes

  Applied Materials, Inc.

  0 cites
• US118210822023

  Reduced Defect Deposition Processes

  Applied Materials, Inc.

  0 cites
• US116004702023

  Targeted Heat Control Systems

  Applied Materials, Inc.

  0 cites