Xiangxin Rui

7 Patents

• US121487662024

  High-k Dielectric Materials Comprising Zirconium Oxide Utilized in Display Devices

  Applied Materials, Inc.

  0 cites
• US120767632024

  Selective In-situ Cleaning of High-k Films from Processing Chamber Using Reactive Gas Precursor

  Applied Materials, Inc.

  0 cites
• US120807252024

  Hybrid High-k Dielectric Material Film Stacks Comprising Zirconium Oxide Utilized in Display Devices

  Applied Materials, Inc.

  0 cites
• US118943962024

  High-k Dielectric Materials Comprising Zirconium Oxide Utilized in Display Devices

  APPLIED MATERIALS, Inc.

  0 cites
• US117423622023

  Hybrid High-k Dielectric Material Film Stacks Comprising Zirconium Oxide Utilized in Display Devices

  APPLIED MATERIAL, Inc.

  0 cites
• US116642162023

  ALD Process and Hardware with Improved Purge Efficiency

  APPLIED MATERIALS, Inc.

  0 cites
• US116006422023

  Layer Stack for Display Applications

  APPLIED MATERIALS, Inc.

  0 cites