37 Patents
- 0 cites
- US125637792026Gate-all-around Integrated Structures Having Gate Height Reduction and Dielectric Capping Material with Shoulder Portions Inside Gate Stack
Intel Corporation
0 cites - US125074642025Gate Aligned Fin Cut for Advanced Integrated Circuit Structure Fabrication
Intel Corporation
0 cites - 0 cites
- US124023492025Gate-all-around Integrated Circuit Structures Having Devices with Channel-to-substrate Electrical Contact
Intel Corporation
0 cites - US123827062025Self-aligned Gate Endcap (SAGE) Architectures with Gate-all-around Devices
Intel Corporation
0 cites - US123693922025Fabrication of Gate-all-around Integrated Circuit Structures Having Pre-spacer Deposition Cut Gates
Intel Corporation
0 cites - US123493942025Dielectric Isolation Layer Between a Nanowire Transistor and a Substrate
Intel Corporation
0 cites - 0 cites
- US123289202025Nanoribbon Sub-fin Isolation by Backside Si Substrate Removal Etch Selective to Source and Drain Epitaxy
Intel Corporation
0 cites - US123026322025Non-planar Integrated Circuit Structures Having Mitigated Source or Drain Etch from Replacement Gate Process
Intel Corporation
0 cites - US122940062025Gate-all-around Integrated Circuit Structures Having Insulator Substrate
Intel Corporation
0 cites - US122887892025Gate-all-around Integrated Circuit Structures Having Devices with Source/drain-to-substrate Electrical Contact
Intel Corporation
0 cites - US122727372025Gate-all-around Integrated Circuit Structures Having Adjacent Structures for Sub-fin Electrical Contact
Intel Corporation
0 cites - US122243502025Self-aligned Gate Endcap (SAGE) Architectures with Gate-all-around Devices
Intel Corporation
0 cites - US121660312024Substrate-less Electrostatic Discharge (ESD) Integrated Circuit Structures
Intel Corporation
0 cites - US120973642024Apparatus, Systems, and Methods for Percutaneous Pneumatic Cardiac Assistance
PERCASSIST, Inc.
0 cites - US120683142024Fabrication of Gate-all-around Integrated Circuit Structures Having Adjacent Island Structures
Intel Corporation
0 cites - US120149592024Integrated Nanowire and Nanoribbon Patterning in Transistor Manufacture
Intel Corporation
0 cites - US119904722024Fabrication of Gate-all-around Integrated Circuit Structures Having Pre-spacer Deposition Cut Gates
Intel Corporation
0 cites - 0 cites
- US119088562024Gate-all-around Integrated Circuit Structures Having Devices with Source/drain-to-substrate Electrical Contact
Intel Corporation
0 cites - US119014582024Dielectric Isolation Layer Between a Nanowire Transistor and a Substrate
Intel Corporation
0 cites - US118943682024Gate-all-around Integrated Circuit Structures Fabricated Using Alternate Etch Selective Material
Intel Corporation
0 cites - 0 cites
- US118698912024Non-planar Integrated Circuit Structures Having Mitigated Source or Drain Etch from Replacement Gate Process
Intel Corporation
0 cites - 0 cites
- US118552232023Self-aligned Gate Endcap (SAGE) Architectures with Gate-all-around Devices
Intel Corporation
0 cites - US118376412023Gate-all-around Integrated Circuit Structures Having Adjacent Deep via Substrate Contacts for Sub-fin Electrical Contact
Intel Corporation
0 cites - US118241162023Gate-all-around Integrated Circuit Structures Having Devices with Channel-to-substrate Electrical Contact
Intel Corporation
0 cites - US117990092023Gate-all-around Integrated Circuit Structures Having Adjacent Structures for Sub-fin Electrical Contact
Intel Corporation
0 cites - US117497332023FIN Shaping Using Templates and Integrated Circuit Structures Resulting Therefrom
Intel Corporation
0 cites - 0 cites
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- US115946372023Gate-all-around Integrated Circuit Structures Having Fin Stack Isolation
Intel Corporation
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