Wen-chang Hsueh

4 Patents

• US121305482024

  Extreme Ultraviolet Mask with Reduced Wafer Neighboring Effect

  TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.

  0 cites
• US120193672024

  Mask Blanks and Methods for Depositing Layers on Mask Blank

  TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.

  0 cites
• US118158052023

  Mask for Extreme Ultraviolet Photolithography

  Taiwan Semiconductor Manufacturing Co., Ltd.

  0 cites
• US117405472023

  Method of Manufacturing Extreme Ultraviolet Mask with Reduced Wafer Neighboring Effect

  TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.

  0 cites