Patents/Inventors

Weihua Yin

San Jose, CAUS3 patents

3 Patents

US125557402026
Charged Particle System, Aperture Array, Charged Particle Tool and Method of Operating a Charged Particle System
ASML Netherlands B.V.
0 cites
US123745242025
In-lens Wafer Pe-charging and Inspection with Multiple Beams
ASML Netherlands B.V.
0 cites
US121658372024
System and Method for Scanning a Sample Using Multi-beam Inspection Apparatus
ASML Netherlands B.V.
0 cites