Weihong Liu

8 Patents

• US126191492026

  Dnq-free Chemically Amplified Resist Composition

  Merck Patent GmbH

  0 cites
• US124868832025

  Internal Magnetic Control Device, Flywheel Assembly and Fitness Equipment

  Ningbo Delconix Technologies Co., Ltd.

  0 cites
• US124361502025

  CD127 Expression Inversely Correlates with Foxp3 and Suppressive Function of CD4+ Tregs

  The Regents Of The University Of California

  0 cites
• US123931152025

  Positive Working Photosensitive Material

  Merck Patent GmbH

  0 cites
• US122769092025

  Novolak/dnq Based, Chemically Amplified Photoresist

  Merck Patent GmbH

  0 cites
• US120585342024

  Method of Measuring AAS EMF

  Telefonaktiebolaget LM Ericsson (Publ)

  0 cites
• US118222422023

  Dnq-type Photoresist Composition Including Alkali-soluble Acrylic Resins

  Merck Patent GmbH

  0 cites
• US116985862023

  Negative-working Ultra Thick Film Photoresist

  Merck Patent GmbH

  0 cites