4 Patents
- US126107732026Systems and Methods for Metastable Activated Radical Selective Strip and Etch Using Dual Plenum Showerhead
LAM RESEARCH CORPORATION
0 cites - US122725702025Systems and Methods for Metastable Activated Radical Selective Strip and Etch Using Dual Plenum Showerhead
LAM RESEARCH CORPORATION
0 cites - US122725712025Systems and Methods for Metastable Activated Radical Selective Strip and Etch Using Dual Plenum Showerhead
LAM RESEARCH CORPORATION
0 cites - US120572952024RF Power Compensation to Reduce Deposition or Etch Rate Changes in Response to Substrate Bulk Resistivity Variations
Lam Research Corporation
0 cites