Patents/Inventors

Wataru Shibayama

ToyamaJP10 patents

9 Patents

US125851882026
Composition for Forming Resist Underlying Film
NISSAN CHEMICAL CORPORATION
0 cites
US124932432025
Film-forming Composition
NISSAN CHEMICAL CORPORATION
0 cites
US123728752025
Composition for Resist Pattern Metallization Process
NISSAN CHEMICAL CORPORATION
0 cites
US122482512025
Silicon-containing Resist Underlayer Film-forming Composition Including Organic Group Having Ammonium Group
NISSAN CHEMICAL CORPORATION
0 cites
US122276212025
Film-forming Composition
NISSAN CHEMICAL CORPORATION
0 cites
US120845922024
Coating Composition for Pattern Inversion
NISSAN CHEMICAL CORPORATION
0 cites
US119661642024
Semiconductor Device Production Method Employing Silicon-containing Resist Underlayer Film-forming Composition Including Organic Group Having Ammonium Group
NISSAN CHEMICAL CORPORATION
0 cites
US118158152023
Composition for Forming Silicon-containing Resist Underlayer Film Removable by Wet Process
NISSAN CHEMICAL INDUSTRIES, Ltd.
0 cites
US115614722023
Radiation Sensitive Composition
NISSAN CHEMICAL INDUSTRIES, Ltd.
0 cites