31 Patents
- US125060012025Low-k Feature Formation Processes and Structures Formed Thereby
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - 0 cites
- US124955682025Dummy Fin Structures and Methods of Forming Same
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US124446022025Semiconductor Device Structure and Methods of Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US124143202025Fin Field-effect Transistor Device with Composite Liner for the Fin
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US123680442025Methods of Forming Dielectric Layers Through Deposition and Anneal Processes
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US122888142025Semiconductor Device and Method of Manufacture
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US122667282025Semiconductor Device and Method of Manufacture
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US122610422025Forming Nitrogen-containing Layers as Oxidation Blocking Layers
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US122552412025Low-k Feature Formation Processes and Structures Formed Thereby
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - 0 cites
- US122060132025Post-formation Mends of Dielectric Features
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US121762062024Varying Temperature Anneal for Film and Structures Formed Thereby
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US121763492024Semiconductor Device and Method of Manufacture
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US121486522024Silicon Oxide Layer for Oxidation Resistance and Method Forming Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US120878432024Semiconductor Device and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - 0 cites
- US119488412024Forming Nitrogen-containing Low-k Gate Spacer
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US119423292024Formation Method of Semiconductor Device with Dielectric Isolation Structure
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US119425492024Semiconductor Device and Method of Manufacture
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US119161322024Semiconductor Device and Method of Manufacture
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US118944642024Fin Field-effect Transistor Device with Composite Liner for the Fin
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US117642212023Semiconductor Device and Method of Manufacture
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - 0 cites
- US117422012023Method of Filling Gaps with Carbon and Nitrogen Doped Film
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd
0 cites - US117216992023Semiconductor Device and Method of Manufacture
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US117156372023Varying Temperature Anneal for Film and Structures Formed Thereby
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US117107822023Post-formation Mends of Dielectric Features
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US117053272023Low-k Feature Formation Processes and Structures Formed Thereby
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - 0 cites
- US116409782023Low-k Feature Formation Processes and Structures Formed Thereby
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites