Patents/Inventors

Vladimir Levinski

Migdal HaEmekIL32 patents

28 Patents

US125852002026
Imaging Overlay with Mutually Coherent Oblique Illumination
KLA Corporation
0 cites
US125608712026
Metrology Target for Scanning Metrology
KLA Corporation
0 cites
US125108312025
Robust and Accurate Overlay Target Design for CMP
KLA Corporation
0 cites
US125046972025
Single Grab Pupil Landscape via Broadband Illumination
KLA Corporation
0 cites
US124871902025
System and Method for Isolation of Specific Fourier Pupil Frequency in Overlay Metrology
KLA Corporation
0 cites
US124875332025
Amplitude Asymmetry Measurements in Overlay Metrology
KLA Corporation
0 cites
US124114202025
Small In-die Target Design for Overlay Measurement
KLA Corporation
0 cites
US122538052025
Scatterometry Overlay Metrology with Orthogonal Fine-pitch Segmentation
KLA Corporation
0 cites
US122355882025
Scanning Overlay Metrology with High Signal to Noise Ratio
KLA Corporation
0 cites
US122221992025
Systems and Methods for Measurement of Misregistration and Amelioration Thereof
KLA Corporation
0 cites
US121702152024
Systems and Methods for Correction of Impact of Wafer Tilt on Misregistration Measurements
KLA Corporation
0 cites
US121659302024
Adaptive Modeling Misregistration Measurement System and Method
KLA Corporation
0 cites
US121408592024
Overlay Target Design for Improved Target Placement Accuracy
KLA Corporation
0 cites
US121115802024
Optical Metrology Utilizing Short-wave Infrared Wavelengths
KLA Corporation
0 cites
US121054142024
Targets for Diffraction-based Overlay Error Metrology
KLA Corporation
0 cites
US121054332024
Imaging Overlay Targets Using Moiré Elements and Rotational Symmetry Arrangements
KLA Corporation
0 cites
US120786012024
Universal Metrology Model
KLA Corporation
0 cites
US120677452024
Image Pre-processing for Overlay Metrology Using Decomposition Techniques
KLA Corporation
0 cites
US120323002024
Imaging Overlay with Mutually Coherent Oblique Illumination
KLA Corporation
0 cites
US120136342024
Reduction or Elimination of Pattern Placement Error in Metrology Measurements
KLA-TENCOR CORPORATION
0 cites
US120011482024
Enhancing Performance of Overlay Metrology
KLA Corporation
0 cites
US119675352024
On-product Overlay Targets
KLA CORPORATION
0 cites
US118525902023
Systems and Methods for Metrology with Layer-specific Illumination Spectra
KLA Corporation
0 cites
US118416212023
Moiré Scatterometry Overlay
KLA Corporation CA
0 cites
US118153472023
Optical Near-field Metrology
Kla-tencor Corporation
0 cites
US117094332023
Device-like Metrology Targets
Kla-tencor Corporation
0 cites
US116146922023
Self-moire Grating Design for Use in Metrology
KLA Corporation
0 cites
US115927552023
Enhancing Performance of Overlay Metrology
KLA Corporation
0 cites