Venkateswara R. Pallem

6 Patents

• US124350962025

  Indium Precursors for Vapor Depositions

  American Air Liquide, Inc.

  0 cites
• US123277322025

  Method to Improve Profile Control During Selective Etching of Silicon Nitride Spacers

  American Air Liquide, Inc.

  0 cites
• US121878532025

  Silicon-based Self-assembling Monolayer Compositions and Surface Preparation Using the Same

  American Air Liquide, Inc.

  0 cites
• US118374742023

  Method to Improve Profile Control During Selective Etching of Silicon Nitride Spacers

  American Air Liquide, Inc.

  0 cites
• US118210802023

  Reagents to Remove Oxygen from Metal Oxyhalide Precursors in Thin Film Deposition Processes

  L'air Liquide Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude

  0 cites
• US117840412023

  Preparation of Lanthanide-containing Precursors and Deposition of Lanthanide-containing Films

  American Air Liquide, Inc.

  0 cites