31 Patents
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- US126105842026Selective Growth of High-k Oxide on Channel of Gate-all-around Transistors
Intel Corporation
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- US124379292025Capacitor with an Electrically Conductive Layer Coupled with a Metal Layer of the Capacitor
Intel Corporation
0 cites - US124329762025Thin Film Transistors Having Strain-inducing Structures Integrated with 2D Channel Materials
Intel Corporation
0 cites - US124067132025Probabilistic Computing Devices Based on Stochastic Switching in a Ferroelectric Field-effect Transistor
Intel Corporation
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- US123494422025Thin Film Transistors Having Semiconductor Structures Integrated with 2D Channel Materials
Intel Corporation
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- US119800372024Memory Cells with Ferroelectric Capacitors Separate from Transistor Gate Stacks
Intel Corporation
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- US117990292023Multilayer Insulator Stack for Ferroelectric Transistor and Capacitor
Intel Corporation
0 cites - US117857592023Floating Body Memory Cell Having Gates Favoring Different Conductivity Type Regions
Intel Corporation
0 cites - US117424072023Multilayer High-k Gate Dielectric for a High Performance Logic Transistor
Intel Corporation
0 cites - US117341742023Low Overhead, High Bandwidth Re-configurable Interconnect Apparatus and Method
Intel Corporation
0 cites - US117356522023Field Effect Transistors Having Ferroelectric or Antiferroelectric Gate Dielectric Structure
Intel Corporation
0 cites - US116535022023Fefet with Embedded Conductive Sidewall Spacers and Process for Forming the Same
Intel Corporation
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