9 Patents
- US125687002026Method for Forming Isolation Structure and Semiconductor Structure
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY Ltd.
0 cites - US125506972026Different Isolation Liners for Different Type Finfets and Associated Isolation Feature Fabrication
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US123494932025Semiconductor Structure and Manufacturing Method of the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY Ltd.
0 cites - 0 cites
- US121424902024Performing Annealing Process to Improve Fin Quality of a Finfet Semiconductor
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US120209882024Fin Field Effect Transistor (finfet) Device Structure with Dummy Fin Structure
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US118482302023Different Isolation Liners for Different Type Finfets and Associated Isolation Feature Fabrication
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US118483392023Semiconductor Structure Including Isolation Structure and Method for Forming Isolation Structure
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY Ltd.
0 cites - US115691302023Fin Field Effect Transistor (finfet) Device Structure with Dummy Fin Structure
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites