Tzu-yang Ho

5 Patents

• US123680982025

  Methods of Forming Semiconductor Device

  Taiwan Semiconductor Manufacturing Company, Ltd.

  0 cites
• US122552402025

  Topology Selective and Sacrificial Silicon Nitride Layer for Generating Spacers for a Semiconductor Device Drain

  Taiwan Semiconductor Manufacturing Company, Ltd.

  0 cites
• US121991572025

  Semiconductor Device Structure and Methods of Forming the Same

  TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.

  0 cites
• US119730272024

  Semiconductor Device and Methods of Forming the Same

  Taiwan Semiconductor Manufacturing Company, Ltd.

  0 cites
• US117423992023

  Topology Selective and Sacrificial Silicon Nitride Layer for Generating Spacers for a Semiconductor Device Drain

  Taiwan Semiconductor Manufacturing Company, Ltd.

  0 cites