19 Patents
- US124083872025Transistor with a Negative Capacitance and a Method of Creating the Same
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US123826502025Multi-layer Dielectric Refill for Profile Control in Semiconductor Devices
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US123242142025Method and Related Apparatus for Integrating Electronic Memory in an Integrated Chip
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US123026332025Semiconductor Devices and Methods of Manufacturing Thereof
Taiwan Semiconductor Manufacturing Company Limited
0 cites - US122439302025Semiconductor Device with Fin End Spacer Dummy Gate and Method of Manufacturing the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US122243342025Semiconductor Device with Gate Dielectric Formed Using Selective Deposition
NATIONAL TAIWAN NORMAL UNIVERSITY
0 cites - US121129872024Semiconductor Device with Fin End Spacer Plug and Method of Manufacturing the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US120466632024Fin Field-effect Transistor and Method of Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED
0 cites - US120210842024Semiconductor Devices and Methods of Manufacturing Thereof
Taiwan Semiconductor Manufacturing Company Limited
0 cites - US119964722024Multi-layer Dielectric Refill for Profile Control in Semiconductor Devices
Taiwan Semiconductor Manufacturing Company Limited
0 cites - US119555472024Semiconductor Device Including an Epitaxy Region
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US119294252024Nanowire Stack GAA Device with Inner Spacer
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US118174882023Method and Related Apparatus for Integrating Electronic Memory in an Integrated Chip
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US117988492023Semiconductor Device with Fin End Spacer Plug and Method of Manufacturing the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US117217002023Semiconductor Devices and Methods of Manufacturing Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US116997392023Semiconductor Device with Gate Dielectric Formed Using Selective Deposition
NATIONAL TAIWAN NORMAL UNIVERSITY
0 cites - US116265102023Fin Field-effect Transistor and Method of Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US116055622023Semiconductor Device with Fin End Spacer and Method of Manufacturing the Same
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US116007182023Multi-layer Dielectric Refill for Profile Control in Semiconductor Devices
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED
0 cites