7 Patents
- US124697442025Method for Forming Finfet with Source/drain Regions Comprising an Insulator Layer
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - 0 cites
- US122437842025Silicon Phosphide Semiconductor Device
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - 0 cites
- US118239492023Finfet with Source/drain Regions Comprising an Insulator Layer
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - 0 cites
- 0 cites