Patents/Inventors

Tsutomu Tanaka

TokyoJP16 patents

16 Patents

USD11121522026
Servo Amplifier
Mitsubishi Electric Corporation
0 cites
US124566022025
Semiconductor Processing Chambers and Methods for Deposition and Etch
Applied Materials, Inc.
0 cites
USD10815692025
Servo Amplifier
Mitsubishi Electric Corporation
0 cites
USD10768072025
Servo Amplifier
Mitsubishi Electric Corporation
0 cites
US122886772025
Vertically Adjustable Plasma Source
Applied Materials, Inc.
0 cites
US122241562025
Microwave Plasma Source for Spatial Plasma Enhanced Atomic Layer Deposition (PE-ALD) Processing Tool
Applied Materials, Inc.
0 cites
US122058452025
Semiconductor Processing Chamber to Accommodate Parasitic Plasma Formation
Applied Materials, Inc.
0 cites
US121958512025
Thin Layer Deposition with Plasma Pulsing
Applied Materials, Inc.
0 cites
USD10536952024
Servo Amplifier
Mitsubishi Electric Corporation
0 cites
US121424592024
Single Chamber Flowable Film Formation and Treatments
Applied Materials, Inc.
0 cites
US119231722024
Paired Dynamic Parallel Plate Capacitively Coupled Plasmas
APPLIED MATERIALS, Inc.
0 cites
US118878182024
Methods and Systems to Modulate Film Stress
Applied Materials, Inc.
0 cites
US118238712023
Microwave Plasma Source for Spatial Plasma Enhanced Atomic Layer Deposition (PE-ALD) Processing Tool
Applied Materials, Inc.
0 cites
US117767932023
Plasma Source with Ceramic Electrode Plate
Applied Materials, Inc.
0 cites
US117053122023
Vertically Adjustable Plasma Source
Applied Materials, Inc.
0 cites
US116995712023
Semiconductor Processing Chambers for Deposition and Etch
Applied Materials, Inc.
0 cites