Patents/Inventors

Tsutomu Shoki

TokyoJP13 patents

14 Patents

US123139682025
Reflective Mask Blank, Reflective Mask, and Method for Manufacturing Semiconductor Device
HOYA CORPORATION
0 cites
US121354962024
Reflective Mask Blank and Reflective Mask
HOYA CORPORATION
0 cites
US121115662024
Reflective Mask Blank, Reflective Mask and Manufacturing Method Thereof, and Semiconductor Device Manufacturing Method
HOYA CORPORATION
0 cites
US121054132024
Reflective Mask Blank, Reflective Mask, Method of Manufacturing Reflective Mask, and Method of Manufacturing Semiconductor Device
HOYA CORPORATION
0 cites
US120726192024
Reflective Mask Blank, Reflective Mask, and Method for Manufacturing Reflective Mask and Semiconductor Device
HOYA CORPORATION
0 cites
US120259112024
Reflective Structure, Reflective Mask Blank, Reflective Mask and Method of Manufacturing Semiconductor Device
HOYA CORPORATION
0 cites
US120193662024
Reflective Mask Blank, Reflective Mask, and Method for Manufacturing Reflective Mask and Semiconductor Device
HOYA CORPORATION
0 cites
US118801302024
Reflective Mask Blank, Reflective Mask and Method of Manufacturing Semiconductor Device
HOYA CORPORATION
0 cites
US118529642023
Method for Manufacturing Reflective Mask Blank, Reflective Mask Blank, Method for Manufacturing Reflective Mask, Reflective Mask, and Method for Manufacturing Semiconductor Device
HOYA CORPORATION
0 cites
US118158062023
Reflective Mask Blank, Reflective Mask and Manufacturing Method Thereof, and Semiconductor Device Manufacturing Method
HOYA CORPORATION
0 cites
US118158072023
Reflective Mask Blank, Reflective Mask, Method of Manufacturing Reflective Mask, and Method of Manufacturing Semiconductor Device
HOYA CORPORATION
0 cites
US116812142023
Substrate with a Multilayer Reflective Film, Reflective Mask Blank, Reflective Mask and Method of Manufacturing Semiconductor Device
HOYA Corporation
0 cites
US115614632023
Substrate with Conductive Film, Substrate with Multilayer Reflective Film, Reflective Mask Blank, Reflective Mask, and Semiconductor Device Manufacturing Method
HOYA CORPORATION
0 cites
US115502152023
Reflective Mask Blank, Reflective Mask, Method of Manufacturing Reflective Mask, and Method of Manufacturing Semiconductor Device
HOYA CORPORATION
0 cites