19 Patents
- US124986392025Material for Forming Adhesive Film, Method for Forming Adhesive Film Using the Same, and Patterning Process Using Material for Forming Adhesive Film
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - US123796632025Material for Forming Organic Film, Patterning Process, and Polymer
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - US123517422025Material for Forming Adhesive Film, Patterning Process, and Method for Forming Adhesive Film
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - US123325652025Thermosetting Iodine- and Silicon-containing Material, Composition Containing the Material for Forming Resist Underlayer Film for EUV Lithography, and Patterning Process
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - US123325672025Composition for Forming Silicon-containing Resist Underlayer Film, Patterning Process, and Silicon Compound
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - US121745412024Composition for Forming Silicon-containing Resist Underlayer Film and Patterning Process
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - US121054202024Coating-type Composition for Forming Organic Film, Patterning Process, Polymer, and Method for Manufacturing Polymer
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - US120858572024Composition for Forming Silicon-containing Resist Underlayer Film and Patterning Process
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - US120322932024Composition for Forming Organic Film, Patterning Process, and Polymer
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - US120136402024Resist Underlayer Film Material, Patterning Process, and Method for Forming Resist Underlayer Film
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - US120011382024Composition for Forming Silicon-containing Resist Underlayer Film and Patterning Process
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - US119142952024Thermosetting Iodine- and Silicon-containing Material, Composition Containing the Material for Forming Resist Underlayer Film for EUV Lithography, and Patterning Process
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - US116920662023Material for Forming Organic Film, Substrate for Manufacturing Semiconductor Device, Method for Forming Organic Film, Patterning Process, and Compound for Forming Organic Film
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - US116768142023Material for Forming Organic Film, Substrate for Manufacturing Semiconductor Apparatus, Method for Forming Organic Film, and Patterning Process
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - US116356912023Composition for Forming Organic Film, Substrate for Manufacturing Semiconductor Device, Method for Forming Organic Film, Patterning Process, and Polymer
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - 0 cites
- US116159782023Method for Controlling Flatness, Method for Forming Coating Film, Apparatus for Controlling Flatness, and Apparatus for Forming Coating Film
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - US115922872023Method for Measuring Distance of Diffusion of Curing Catalyst
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - US115556972023Method for Measuring Distance of Diffusion of Curing Catalyst
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites