9 Patents
- US125989372026Epitaxial Formation with Treatment and Semiconductor Devices Resulting Therefrom
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US125016872025Dual Silicide Layers in Semiconductor Devices
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US124777782025Epitaxial Structure for Source/drain Contact for Semiconductor Structure Having Fin Structure
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US122306922025Self-aligned Inner Spacer on Gate-all-around Structure and Methods of Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US121488072024Backside Contact Structures with Stacked Metal Silicide Layers for Source/drain Region of Fin Field Transistors
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - 0 cites
- US118307732023Semiconductor Device with Isolation Structures
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US117497422023Self-aligned Inner Spacer on Gate-all-around Structure and Methods of Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - 0 cites