8 Patents
- US124396572025Confined Source/drain Epitaxy Regions and Method Forming Same
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US123896492025Transistors with Stacked Semiconductor Layers as Channels
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - 0 cites
- US120574502024Epitaxy Regions with Large Landing Areas for Contact Plugs
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US119489712024Confined Source/drain Epitaxy Regions and Method Forming Same
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US116521052023Epitaxy Regions with Large Landing Areas for Contact Plugs
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US115814252023Method for Manufacturing Semiconductor Structure with Enlarged Volumes of Source-drain Regions
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US115690842023Method for Manufacturing Semiconductor Structure with Reduced Nodule Defects
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites