6 Patents
- 0 cites
- US119403912024Defect Inspection Apparatus, Method for Inspecting Defect, and Method for Manufacturing Photomask Blank
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - US118605292024Substrate with Multilayer Reflection Film for EUV Mask Blank, Manufacturing Method Thereof, and EUV Mask Blank
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - US118358512023Substrate with Multilayer Reflection Film for EUV Mask Blank, Manufacturing Method Thereof, and EUV Mask Blank
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - US117893572023Method of Manufacturing Reflective Mask Blank, and Reflective Mask Blank
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - US116247122023Substrate Defect Inspection Method and Substrate Defect Inspection Apparatus
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites