10 Patents
- US123325652025Thermosetting Iodine- and Silicon-containing Material, Composition Containing the Material for Forming Resist Underlayer Film for EUV Lithography, and Patterning Process
SHIN-ETSU CHEMICAL CO., Ltd.
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- US119142952024Thermosetting Iodine- and Silicon-containing Material, Composition Containing the Material for Forming Resist Underlayer Film for EUV Lithography, and Patterning Process
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - 0 cites
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- US115922872023Method for Measuring Distance of Diffusion of Curing Catalyst
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - US115556972023Method for Measuring Distance of Diffusion of Curing Catalyst
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites