Patents/Inventors

Tse-yao Huang

Taipei CityTW97 patents

112 Patents

US125936352026
Semiconductor Device Structure with Composite Hard Mask and Method for Preparing the Same
NANYA TECHNOLOGY CORPORATION
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US125936772026
Semiconductor Device Structure with Energy Removable Structure and Method for Preparing the Same
NANYA TECHNOLOGY CORPORATION
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US125387292026
Semiconductor Device Structure with Composite Hard Mask and Method for Preparing the Same
NANYA TECHNOLOGY CORPORATION
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US125387882026
Semiconductor Device with Filling Layer and Method for Fabricating the Same
NANYA TECHNOLOGY CORPORATION
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US125016862025
Semiconductor Device with Capping Layer
NANYA TECHNOLOGY CORPORATION
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US124890142025
Method for Fabricating Semiconductor Device with Multi-carbon-concentration Dielectrics
NANYA TECHNOLOGY CORPORATION
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US124890722025
Semiconductor Device with Air Gap and Method for Preparing the Same
NANYA TECHNOLOGY CORPORATION
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US124826492025
Semiconductor Device with Porous Layer and Method for Fabricating the Same
NANYA TECHNOLOGY CORPORATION
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US124761162025
Semiconductor Structure with Anti-back-sputter Layer
NANYA TECHNOLOGY CORPORATION
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US124777142025
Method for Manufacturing Memory Device Having a Protruding Channel Structure
NANYA TECHNOLOGY CORPORATION
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US124566842025
Semiconductor Device Structure Including Composite Interconnect
NANYA TECHNOLOGY CORPORATION
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US124380882025
Composite Interconnect Semiconductor Device Structure
NANYA TECHNOLOGY CORPORATION
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US124314272025
Semiconductor Device Structure with Liner Layer Having Tapered Sidewall and Method for Preparing the Same
NANYA TECHNOLOGY CORPORATION
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US124329042025
Semiconductor Device with Peripheral Gate Structure and Method for Fabricating the Same
NANYA TECHNOLOGY CORPORATION
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US124245562025
Semiconductor Device with Adjustment Layers and Method for Fabricating the Same
NANYA TECHNOLOGY CORPORATION
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US124084212025
Semiconductor Device with Work Function Layer
NANYA TECHNOLOGY CORPORATION
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US124009552025
Semiconductor Device with Porous Dielectric Layers and Method for Fabricating the Same
NANYA TECHNOLOGY CORPORATION
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US123962062025
Semiconductor Device with Shallow Contacts and Method for Fabricating the Same
NANYA TECHNOLOGY CORPORATION
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US123811572025
Semiconductor Device with an Insulative Decoupling Unit Positioned Between Two of a Plurality of Conductive Features
NANYA TECHNOLOGY CORPORATION
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US123622902025
Semiconductor Structure with a Porous Structure
NANYA TECHNOLOGY CORPORATION
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US123639862025
Semiconductor Device with Contact Structure and Method for Fabricating the Same
NANYA TECHNOLOGY CORPORATION
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US123493962025
Semiconductor Device with Shallow Contacts and Method for Fabricating the Same
NANYA TECHNOLOGY CORPORATION
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US123410622025
Method for Fabricating Semiconductor Device with Liner Structure
NANYA TECHNOLOGY CORPORATION
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US123425972025
Semiconductor Device with Buried Gate Structures and Method for Preparing the Same
NANYA TECHNOLOGY CORPORATION
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US123362622025
Semiconductor Device with Contact Structure and Method for Fabricating the Same
NANYA TECHNOLOGY CORPORATION
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US123277932025
Semiconductor Device with Adjustment Layers and Method for Fabricating the Same
NANYA TECHNOLOGY CORPORATION
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US123158082025
Semiconductor Device with Liner Structure
NANYA TECHNOLOGY CORPORATION
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US123082912025
Method for Preparing Semiconductor Device Structure with Barrier Portion
NANYA TECHNOLOGY CORPORATION
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US123083182025
Semiconductor Device Structure with Barrier Portion
NANYA TECHNOLOGY CORPORATION
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US123100842025
Semiconductor Device with Assistant Cap and Method for Fabricating the Same
NANYA TECHNOLOGY CORPORATION
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US122951502025
Semiconductor Device with Ring-shaped Electrode and Method for Preparing the Same
NANYA TECHNOLOGY CORPORATION
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US122781522025
Semiconductor Device with Cushion Structure and Method for Fabricating the Same
NANYA TECHNOLOGY CORPORATION
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US122781532025
Semiconductor Device with Cushion Structure and Method for Fabricating the Same
NANYA TECHNOLOGY CORPORATION
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US122781832025
Semiconductor Device with Multi-carbon-concentration Dielectrics
NANYA TECHNOLOGY CORPORATION
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US122794162025
Semiconductor Device with Air Gap and Method for Preparing the Same
NANYA TECHNOLOGY CORPORATION
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US122794562025
Semiconductor Device with Buried Gate Structures
NANYA TECHNOLOGY CORPORATION
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US122794572025
Semiconductor Device with Epitaxial Bottom Assistant Layer
NANYA TECHNOLOGY CORPORATION
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US122740522025
Semiconductor Device with Vanadium-containing Spacers and Method for Fabricating the Same
NANYA TECHNOLOGY CORPORATION
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US122666002025
Semiconductor Device with Decoupling Unit
NANYA TECHNOLOGY CORPORATION
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US122679952025
Semiconductor Device with Vanadium-containing Spacers and Method for Fabricating the Same
NANYA TECHNOLOGY CORPORATION
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US122611182025
Interconnection Structure with Composite Isolation Feature and Method for Manufacturing the Same
NANYA TECHNOLOGY CORPORATION
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US122551462025
Interconnection Structure with Composite Isolation Feature and Method for Manufacturing the Same
NANYA TECHNOLOGY CORPORATION
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US122438172025
Semiconductor Device with Porous Dielectric Layers and Method for Fabricating the Same
NANYA TECHNOLOGY CORPORATION
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US122373182025
Method for Fabricating Semiconductor Device with Redistribution Structure
NANYA TECHNOLOGY CORPORATION
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US122118312025
Semiconductor Device with Redistribution Structure
NANYA TECHNOLOGY CORPORATION
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US122133062025
Semiconductor Device with Air Gap and Method for Preparing the Same
NANYA TECHNOLOGY CORPORATION
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US122133072025
Semiconductor Device with Air Gap and Method for Preparing the Same
NANYA TECHNOLOGY CORPORATION
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US121763422024
Method for Fabricating Semiconductor Device with Guard Ring
NANYA TECHNOLOGY CORPORATION
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US121548952024
Semiconductor Device with Guard Ring
NANYA TECHNOLOGY CORPORATION
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US121365922024
Method for Manufacturing Semiconductor Structure Having a Porous Structure
NANYA TECHNOLOGY CORPORATION
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US121320972024
Method for Fabricating Semiconductor Device with Graphene-based Element
NANYA TECHNOLOGY CORPORATION
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US121130282024
Semiconductor Device with Integrated Decoupling and Alignment Features
NANYA TECHNOLOGY CORPORATION
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US120948332024
Semiconductor Device with Alignment Marks and Method for Fabricating the Same
NANYA TECHNOLOGY CORPORATION
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US120948342024
Semiconductor Device with Alignment Marks and Method for Fabricating the Same
NANYA TECHNOLOGY CORPORATION
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US120876202024
Semiconductor Device Structure with Air Gap
NANYA TECHNOLOGY CORPORATION
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US120806422024
Semiconductor Device with Conductive Layers Having Different Pattern Densities and Method for Fabricating the Same
NANYA TECHNOLOGY CORPORATION
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US120807542024
Semiconductor Device with Assistant Layer and Method for Fabricating the Same
NANYA TECHNOLOGY CORPORATION
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US120517182024
Method for Fabricating Semiconductor Device with Assistant Layer
NANYA TECHNOLOGY CORPORATION
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US120274802024
Semiconductor Device with Wire Bond and Method for Preparing the Same
NANYA TECHNOLOGY CORPORATION
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US120210092024
Semiconductor Device with Plug Structure
NANYA TECHNOLOGY CORPORATION
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US119963902024
Semiconductor Device with Stacking Structure
NANYA TECHNOLOGY CORPORATION
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US119425142024
Semiconductor Device
NANYA TECHNOLOGY CORPORATION
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US119358342024
Method for Preparing Semiconductor Device with Contact Structure
NANYA TECHNOLOGY CORPORATION
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US119374172024
Method for Forming Semiconductor Device with Composite Dielectric Structure
NANYA TECHNOLOGY CORPORATION
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US119088162024
Method for Fabricating Semiconductor Device with Graphene Layers
NANYA TECHNOLOGY CORPORATION
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US119013502024
Method for Fabricating Semiconductor Device with Stacking Structure
NANYA TECHNOLOGY CORPORATION
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US118942642024
Method for Fabricating Semiconductor Device with Covering Liners
NANYA TECHNOLOGY CORPORATION
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US118760942024
Method for Fabricating Semiconductor Device
NANYA TECHNOLOGY CORPORATION
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US118774442024
Semiconductor Device and Method for Fabricating the Same
NANYA TECHNOLOGY CORPORATION
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US118308362023
Semiconductor Device with Wire Bond and Method for Preparing the Same
NANYA TECHNOLOGY CORPORATION
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US118308372023
Semiconductor Package with Air Gap
NANYA TECHNOLOGY CORPORATION
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US118308652023
Semiconductor Device with Redistribution Structure and Method for Fabricating the Same
NANYA TECHNOLOGY CORPORATION
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US118309192023
Semiconductor Device and Method for Fabricating the Same
NANYA TECHNOLOGY CORPORATION
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US118239842023
Method for Fabricating Semiconductor Device with Plug Structure
NANYA TECHNOLOGY CORPORATION
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US118240472023
Method for Fabricating Semiconductor Device with Stacked Dies
NANYA TECHNOLOGY CORPORATION
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US118173062023
Method for Manufacturing Semiconductor Package with Air Gap
NANYA TECHNOLOGY CORPORATION
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US117912642023
Method for Preparing Semiconductor Device Including Conductive Contact Having Tapering Profile
NANYA TECHNOLOGY CORPORATION
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US117912942023
Method for Fabricating Semiconductor Device with Stress Relief Structure
NANYA TECHNOLOGY CORPORATION
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US117913282023
Method for Fabricating Semiconductor Device with Integrated Decoupling and Alignment Features
NANYA TECHNOLOGY CORPORATION
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US117913992023
Method for Fabricating Semiconductor Device with Graphene-based Element
NANYA TECHNOLOGY CORPORATION
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US117641782023
Semiconductor Device with Redistribution Structure and Method for Fabricating the Same
NANYA TECHNOLOGY CORPORATION
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US117658842023
Semiconductor Device with Epitaxial Structures and Method for Forming the Same
NANYA TECHNOLOGY CORPORATION
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US117568932023
Semiconductor Device with Alignment Marks and Method for Fabricating the Same
NANYA TECHNOLOGY CORPORATION
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US117587092023
Method for Preparing Semiconductor Device with Epitaxial Structures
NANYA TECHNOLOGY CORPORATION
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US117495982023
Method for Fabricating Semiconductor Device with Test Pad
NANYA TECHNOLOGY CORPORATION
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US117497302023
Semiconductor Device with Contact Structure and Method for Preparing the Same
NANYA TECHNOLOGY CORPORATION
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US117354992023
Semiconductor Device with Protection Layers and Method for Fabricating the Same
NANYA TECHNOLOGY CORPORATION
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US117355272023
Semiconductor Device with Graded Porous Dielectric Structure
NANYA TECHNOLOGY CORPORATION
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US117282992023
Semiconductor Device with Tilted Insulating Layers and Method for Fabricating the Same
NANYA TECHNOLOGY CORPORATION
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US117156902023
Semiconductor Device Having a Conductive Contact with a Tapering Profile
NANYA TECHNOLOGY CORPORATION
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US117106962023
Semiconductor Device with Programmable Unit and Method for Fabricating the Same
NANYA TECHNOLOGY CORPORATION
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US117053802023
Method for Fabricating Semiconductor Device with Protection Layers
NANYA TECHNOLOGY CORPORATION
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US116996172023
Method for Fabricating Semiconductor Device with Alleviation Feature
NANYA TECHNOLOGY CORPORATION
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US116996612023
Method for Fabricating Semiconductor Device
NANYA TECHNOLOGY CORPORATION
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US116887722023
Semiconductor Device with Contact Having Tapered Profile and Method for Fabricating the Same
NANYA TECHNOLOGY CORPORATION
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US116784802023
Method for Fabricating Semiconductor Device with Porous Decoupling Features
NANYA TECHNOLOGY CORPORATION
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US116643412023
Method for Preparing Semiconductor Device with Composite Dielectric Structure
NANYA TECHNOLOGY CORPORATION
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US116476262023
Method for Fabricating Semiconductor Device with Tapering Impurity Region
NANYA TECHNOLOGY CORPORATION
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US116316372023
Method for Fabricating Semiconductor Device with Stress-relieving Structures
NANYA TECHNOLOGY CORPORATION
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US116316552023
Semiconductor Device with Connection Structure and Method for Fabricating the Same
NANYA TECHNOLOGY CORPORATION
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US116317382023
Semiconductor Device and Method for Fabricating the Same
NANYA TECHNOLOGY CORPORATION
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US116317472023
Method for Preparing Semiconductor Device with Gate Spacer
NANYA TECHNOLOGY CORPORATION
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US116213182023
Capacitor, Semiconductor Device, and Method for Preparing Capacitor
NANYA TECHNOLOGY CORPORATION
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US116160222023
Method for Fabricating Semiconductor Device with Porous Insulating Layers
NANYA TECHNOLOGY CORPORATION
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US116108112023
Semiconductor Device with Covering Liners and Method for Fabricating the Same
NANYA TECHNOLOGY CORPORATION
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US116056292023
Method for Preparing Semiconductor Device Structure with Series-connected Transistor and Resistor
NANYA TECHNOLOGY CORPORATION
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US115945392023
Semiconductor Device with Composite Dielectric Structure and Method for Forming the Same
NANYA TECHNOLOGY CORPORATION
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US115812582023
Semiconductor Device Structure with Manganese-containing Interconnect Structure and Method for Forming the Same
NANYA TECHNOLOGY CORPORATION
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US115629582023
Method for Fabricating Semiconductor Device
NANYA TECHNOLOGY CORPORATION
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US115575722023
Semiconductor Device with Stacked Dies and Method for Fabricating the Same
NANYA TECHNOLOGY CORPORATION
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US115520322023
Method for Preparing a Semiconductor Device with Spacer Over Sidewall of Bonding Pad
NANYA TECHNOLOGY CORPORATION
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US115520812023
Method for Fabricating a Semiconductor Device and the Same
NANYA TECHNOLOGY CORPORATION
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