Patents/Inventors

Toshiyuki Uno

TokyoJP8 patents

10 Patents

US122986602025
Reflective Mask Blank for EUV Lithography, Reflective Mask for EUV Lithography, and Method for Manufacturing Same
AGC Inc.
0 cites
US122163972025
Reflective Mask Blank for EUV Lithography, Mask Blank for EUV Lithography, and Manufacturing Methods Thereof
AGC Inc.
0 cites
US122163982025
Reflective Mask Blank and Reflective Mask
AGC Inc.
0 cites
US121241642024
Reflective Mask Blank and Reflective Mask
AGC Inc.
0 cites
US120386852024
Reflective Mask Blank for EUV Lithography
AGC Inc.
0 cites
US119829352024
Reflective Mask Blank for EUV Lithography
AGC Inc.
0 cites
US119538222024
Reflective Mask Blank for EUV Lithography, Reflective Mask for EUV Lithography, and Method for Manufacturing Same
AGC Inc.
0 cites
US119142832024
Reflective Mask Blank and Reflective Mask
AGC Inc.
0 cites
US118222292023
Reflective Mask Blank for EUV Lithography, Mask Blank for EUV Lithography, and Manufacturing Methods Thereof
AGC Inc.
0 cites
US116985802023
Reflective Mask Blank for EUV Lithography
AGC Inc.
0 cites