Patents/Inventors

Toshiyuki Mine

TokyoJP1 patent

2 Patents

US123963742025
Semiconductor Device Comprising Plurality of Diffusion Layer Electrodes with Different Conductivities and Gate Electrodes
Hitachi, Ltd.
0 cites
US122765732025
Water Leakage Position Estimation System, Water Leakage Position Estimation Method, and Water Leakage Position Estimation Program
HITACHI, Ltd.
0 cites