Patents/Inventors

Toru Hisamatsu

MiyagiJP18 patents

15 Patents

US125371592026
Etching Method, Plasma Processing Apparatus, and Processing System
TOKYO ELECTRON LIMITED
0 cites
US125326832026
Apparatus for Substrate Processing
TOKYO ELECTRON LIMITED
0 cites
US125123302025
Substrate Processing Method and Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US124826512025
Substrate Processing Method and Substrate Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US124761152025
Method for Processing Workpiece
TOKYO ELECTRON LIMITED
0 cites
US123343432025
Substrate Processing Method and Substrate Processing System
TOKYO ELECTRON LIMITED
0 cites
US123004672025
Plasma Processing Method and Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US120716872024
Plasma Processing Method and Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US120740092024
Apparatus for Processing a Substrate
TOKYO ELECTRON LIMITED
0 cites
US120209042024
Apparatus for Processing a Substrate
TOKYO ELECTRON LIMITED
0 cites
US119553372024
Substrate Processing Method and Substrate Processing System
TOKYO ELECTRON LIMITED
0 cites
US118239032023
Method for Processing Workpiece
Tokyo Electron Limited
0 cites
US115944222023
Film Etching Method for Etching Film
TOKYO ELECTRON LIMITED
0 cites
US115574852023
Plasma Processing Method and Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US115453552023
Substrate Processing Method and Substrate Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites