24 Patents
- US125640452026Semiconductor Device Structure with Interconnect Structure Having Air Gap
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US125387732026Semiconductor Structure Having Self-aligned Conductive Structure and Method for Forming the Semiconductor Structure
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US124827032025Semiconductor Device Having Thermally Conductive Air Gap Structure and Method for Manufacturing the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US124631342025Semiconductor Interconnection Structure and Methods of Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US124313862025Semiconductor Device Having Metallization Layer with Low Capacitance and Method for Manufacturing the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US124127802025Semiconductor Device Structure and Methods of Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US123811132025Semiconductor Device Structure Having Air Gap and Methods of Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US122305372025Semiconductor Device Structure Having Air Gap and Methods of Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US121762462024Dielectric Capping Structure Overlying a Conductive Structure to Increase Stability
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US121659452024Thermal Interconnect Structure for Thermal Management of Electrical Interconnect Structure
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US120947642024Interconnect Structure and Methods of Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US120681932024Semiconductor Device Structure with Interconnect Structure Having Air Gap
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US120682482024Semiconductor Interconnection Structure and Methods of Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US120625722024Semiconductor Device Having Metallization Layer with Low Capacitance and Method for Manufacturing the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US120338892024Semiconductor Device Structure and Methods of Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US120276062024Semiconductor Devices with Air Gate Spacer and Air Gate Cap
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US120027492024Barrier and Air-gap Scheme for High Performance Interconnects
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US119904002024Capping Layer Overlying Dielectric Structure to Increase Reliability
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US119232432024Semiconductor Structure Having Air Gaps and Method for Manufacturing the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US118549632023Semiconductor Interconnection Structure and Methods of Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US118481982023Method for Manufacturing Semiconductor Device Having Low-k Carbon-containing Dielectric Layer
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US118108152023Dielectric Capping Structure Overlying a Conductive Structure to Increase Stability
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US116580922023Thermal Interconnect Structure for Thermal Management of Electrical Interconnect Structure
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US115575112023Semiconductor Device Structure and Methods of Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites