12 Patents
- US124127792025Bilayer Seal Material for Air Gaps in Semiconductor Devices
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US123693882025Semiconductor Devices with Tunable Low-k Inner Air Spacers
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US123362142025Inner Spacers for Gate-all-around Semiconductor Devices
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US123242002025Seal Material for Air Gaps in Semiconductor Devices
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US120949522024Air Spacer Formation with a Spin-on Dielectric Material
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US119159362024Semiconductor Structure and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US119012202024Bilayer Seal Material for Air Gaps in Semiconductor Devices
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US118552142023Inner Spacers for Gate-all-around Semiconductor Devices
TAIWAN SEMICONDUCTOR MANUFACTURING Co. Ltd.
0 cites - US118482382023Methods for Manufacturing Semiconductor Devices with Tunable Low-k Inner Air Spacers
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US116887662023Seal Material for Air Gaps in Semiconductor Devices
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US116264822023Air Spacer Formation with a Spin-on Dielectric Material
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US115574832023Semiconductor Structure and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites