Timo Laufer

3 Patents

• US123211052025

  Projection Exposure Apparatus for Semiconductor Lithography

  Carl Zeiss SMT GmbH

  0 cites
• US123211062025

  Device for Detecting a Temperature, Installation for Producing an Optical Element and Method for Producing an Optical Element

  CARL ZEISS SMT GmbH

  0 cites
• US121408772024

  Method for Avoiding a Degradation of an Optical Element, Projection System, Illumination System and Projection Exposure Apparatus

  CARL ZEISS SMT GmbH

  0 cites