32 Patents
- 0 cites
- US124630952025Semiconductor Structure with a Laminated Layer
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US124647642025Low Parasitic Capacitance Contact Structure
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US124462752025Semiconductor Device and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US124329942025Source/drain Metal Contact and Formation Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd
0 cites - 0 cites
- US123827092025Semiconductor Device Structure and Method for Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US122665662025Contact Resistance Between via and Conductive Line
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US121837842024Semiconductor Device with Air Gap on Gate Structure and Method for Forming the Same
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US121599222024Method of Fabricating Semiconductor Device
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US121319422024Source/drain Isolation Structure and Methods Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US121259122024Semiconductor Device Structure and Method for Forming the Same Preliminary Class
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US120878602024Methods of Forming Contact Features in Field-effect Transistors
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US120573982024Semiconductor Device with Multi-layer Dielectric and Methods of Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - 0 cites
- US120402732024Semiconductor Device with Multi-layer Dielectric
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US120092542024Contact Resistance Between via and Conductive Line
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - 0 cites
- US120027562024Butted Contacts and Methods of Fabricating the Same in Semiconductor Devices
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US119786692024Semiconductor Structure with a Laminated Layer
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - 0 cites
- 0 cites
- US118551442023Source/drain Metal Contact and Formation Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - 0 cites
- US117157612023Semiconductor Device with Air Gap on Gate Structure and Method for Forming the Same
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US116949212023Source/drain Isolation Structure and Methods Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - 0 cites
- US116370642023Advanced Metal Connection with Metal Cut
Taiwan Semiconductor Manufacturing Company Limited
0 cites - US116371862023Field Effect Transistor Having Gate Contact and Source/drain Contact Separated by a Gap
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US116317492023Method of Fabricating Semiconductor Device
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - 0 cites
- US115814032023Semiconductor Device and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites