Patents/Inventors

Tetsuya Kamimura

ShizuokaJP57 patents

53 Patents

US125884502026
Post-cmp Cleaning Liquid Comprising a Substituted Benzene Anticorrosive Agent, Chelant, and Amine Compound
FUJIFILM Corporation
0 cites
US125720702026
Chemical Liquid, Resist Pattern Forming Method, Semiconductor Chip Manufacturing Method, Chemical Liquid Storage Body, and Chemical Liquid Manufacturing Method
FUJIFILM Corporation
0 cites
US125593012026
Member, Container, Chemical Liquid Storage Body, Reactor, Distillation Column, Filter Unit, Storage Tank, Pipe Line, and Chemical Liquid Manufacturing Method
FUJIFILM Corporation
0 cites
US125542012026
Liquid Chemical and Method for Producing Liquid Chemical
FUJIFILM Corporation
0 cites
US124800722025
Cleaning Fluid and Cleaning Method
FUJIFILM Corporation
0 cites
US124812182025
Treatment Liquid, Method for Washing Substrate, and Method for Removing Resist
FUJIFILM Corporation
0 cites
US124544052025
Chemical Liquid and Chemical Liquid Storage Body
FUJIFILM Corporation
0 cites
US124485412025
Polishing Liquid and Chemical Mechanical Polishing Method
FUJIFILM Corporation
0 cites
US124349972025
Chemical Liquid Storage Body
FUJIFILM Corporation
0 cites
US124364612025
Chemical Liquid, Pattern Forming Method, and Kit
FUJIFILM Corporation
0 cites
US123862652025
Pattern Forming Method and Method for Manufacturing Electronic Device
FUJIFILM Corporation
0 cites
US123728682025
Pattern Forming Method, Kit, and Resist Composition
FUJIFILM Corporation
0 cites
US123728732025
Treatment Liquid for Manufacturing Semiconductor, Pattern Forming Method Using the Same, and Method of Manufacturing Electronic Device Using the Same
FUJIFILM Corporation
0 cites
US123745402025
Post-cmp Semiconductor Cleaning Composition Comprising an Amine/alkanolamine Mixture
FUJIFILM Corporation
0 cites
US123668052025
Chemical Liquid, Rinsing Solution, and Resist Pattern Forming Method
FUJIFILM Corporation
0 cites
US123436812025
Filter Device, Purification Device, Chemical Solution Production Method
FUJIFILM Corporation
0 cites
US123112942025
Chemical Liquid Purification Method and Chemical Liquid
FUJIFILM Corporation
0 cites
US123139762025
Storage Container Storing Treatment Liquid for Manufacturing Semiconductor
FUJIFILM Corporation
0 cites
US122822592025
Liquid Chemical, Method for Producing Liquid Chemical, and Method for Analyzing Test Target Solution
FUJIFILM Corporation
0 cites
US122769152025
Treatment Liquid and Treatment Method
FUJIFILM Corporation
0 cites
US122538012025
Solution, Solution Storage Body, Actinic Ray-sensitive or Radiation-sensitive Resin Composition, Pattern Forming Method, and Manufacturing Method of Semiconductor Device
FUJIFILM Corporation
0 cites
US122473002025
Cleaning Solution and Cleaning Method
FUJIFILM Corporation
0 cites
US122355842025
Chemical Liquid, Chemical Liquid Storage Body, Resist Pattern Forming Method, and Semiconductor Chip Manufacturing Method
FUJIFILM Corporation
0 cites
US122288572025
Solution, Solution Storage Body, Actinic Ray-sensitive or Radiation-sensitive Resin Composition, Pattern Forming Method, and Manufacturing Method of Semiconductor Device
FUJIFILM Corporation
0 cites
US122102872025
Resist Pattern Forming Method and Semiconductor Chip Manufacturing Method
FUJIFILM Corporation
0 cites
US121889012025
Management Method, Measuring Method, Measuring Device, Crystal Oscillator Sensor, and Set
FUJIFILM Corporation
0 cites
US121693622024
Chemical Liquid, Chemical Liquid Storage Body, Chemical Liquid Filling Method, and Chemical Liquid Storage Method
FUJIFILM Corporation
0 cites
US121619732024
Filtering Device, Purification Device, and Method for Manufacturing Chemical Liquid
FUJIFILM Corporation
0 cites
US120979962024
Container, Method for Manufacturing Container, and Chemical Liquid Storage Body
FUJIFILM Corporation
0 cites
US120983012024
Polishing Liquid and Chemical Mechanical Polishing Method
FUJIFILM Corporation
0 cites
US120307132024
Chemical Liquid and Chemical Liquid Storage Body
FUJIFILM Corporation
0 cites
US120126582024
Composition, Kit, and Method for Treating Substrate
FUJIFILM Corporation
0 cites
US120136442024
Method for Manufacturing Electronic Device
FUJIFILM Corporation
0 cites
US120064462024
Polishing Liquid and Chemical Mechanical Polishing Method
FUJIFILM Corporation
0 cites
US119818822024
Chemical Liquid and Chemical Liquid Storage Body
FUJIFILM Corporation
0 cites
US119760012024
Chemical Liquid Storage Body
FUJIFILM Corporation
0 cites
US119580052024
Chemical Liquid Purification Method and Chemical Liquid
FUJIFILM Corporation
0 cites
US119143002024
Manufacturing Method of Semiconductor Chip, and Kit
FUJIFILM Corporation
0 cites
US118993692024
Treatment Liquid, Method for Washing Substrate, and Method for Removing Resist
FUJIFILM Corporation
0 cites
US118927752024
Storage Container Storing Treatment Liquid for Manufacturing Semiconductor
FUJIFILM Corporation
0 cites
US118782742024
Filtering Device, Purification Device, and Method for Manufacturing Chemical Liquid
FUJIFILM CORPORATION
0 cites
US118334752023
Filtering Device, Purification Device, and Method for Manufacturing Chemical Liquid
FUJIFILM Corporation
0 cites
US117597492023
Filtering Device, Purification Device, and Method for Manufacturing Chemical Liquid
FUJIFILM Corporation
0 cites
US117451422023
Filter Device, Purification Device, Chemical Solution Production Method
FUJIFILM Corporation
0 cites
US117477272023
Chemical Liquid, Chemical Liquid Storage Body, Pattern Forming Method, and Kit
FUJIFILM Corporation
0 cites
US117405572023
Chemical Liquid, Chemical Liquid Storage Body, Chemical Liquid Filling Method, and Chemical Liquid Storage Method
FUJIFILM Corporation
0 cites
US117336112023
Pattern Forming Method, Method for Producing Electronic Device, and Kit
FUJIFILM Corporation
0 cites
US116933212023
Treatment Liquid for Manufacturing Semiconductor, Storage Container Storing Treatment Liquid for Manufacturing Semiconductor, Pattern Forming Method, and Method of Manufacturing Electronic Device
FUJIFILM Corporation
0 cites
US116668642023
Filtering Device, Purification Device, and Method for Manufacturing Chemical Liquid
FUJIFILM Corporation
0 cites
US116284022023
Filtering Device, Purification Device, and Method for Manufacturing Chemical Liquid
FUJIFILM Corporation
0 cites
US115734892023
Solution, Solution Storage Body, Actinic Ray-sensitive or Radiation-sensitive Resin Composition, Pattern Forming Method, and Manufacturing Method of Semiconductor Device
FUJIFILM Corporation
0 cites
US115597582023
Filtering Device, Purification Device, Chemical Liquid Manufacturing Device, Filtered Substance to Be Purified, Chemical Liquid, and Actinic Ray-sensitive or Radiation-sensitive Resin Composition
FUJIFILM Corporation
0 cites
US115413542023
Filtration Device, Refining Device, and Production Method for Liquid Medicine
FUJIFILM CORPORATION
0 cites