Patents/Inventors

Tatsuya Hirata

TokyoJP3 patents

4 Patents

US123862592025
Negative-type Photosensitive Resin Composition and Method for Producing Polyimide and Cured Relief Pattern Using Same
ASAHI KASEI KABUSHIKI KAISHA
0 cites
US121745392024
Negative Photosensitive Resin Composition, Production Method for Polyimide, Production Method for Cured Relief Pattern, and Semiconductor Device
ASAHI KASEI KABUSHIKI KAISHA
0 cites
US119591162024
Method for Producing Nicotinamide Mononucleotide
ASAHI KASEI PHARMA CORPORATION
0 cites
US116401122023
Photosensitive Resin Composition and Method for Producing Cured Relief Pattern
ASAHI KASEI KABUSHIKI KAISHA
0 cites