Patents/Inventors

Taro Ikeda

YamanashiJP41 patents

37 Patents

US126205612026
Plasma Processing Apparatus and Plasma Processing Method
TOKYO ELECTRON LIMITED
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US126146992026
Plasma Source and Plasma Processing Apparatus
Tokyo Electron Limited
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US126092852026
Semiconductor Manufacturing Apparatus and Manufacturing Method for Semiconductor Device
TOKYO ELECTRON LIMITED
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US125623432026
Plasma Processing Method and Plasma Processing Device
Tokyo Electron Limited
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US125557422026
Plasma Processing Apparatus
Tokyo Electron Limited
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US124826372025
Plasma Source and Plasma Processing Apparatus
Tokyo Electron Limited
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US124630132025
Plasma Processing Apparatus
Tokyo Electron Limited
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US124566092025
Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
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US124513262025
Plasma Processing Apparatus and Plasma Processing Method
TOKYO ELECTRON LIMITED
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US124445742025
Plasma Processing Apparatus, and Plasma Processing Method
Tokyo Electron Limited
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US124070782025
Tuner, and Impedance Matching Method
Tokyo Electron Limited
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US123621512025
Plasma Processing Apparatus and Plasma Processing Method
Tokyo Electron Limited
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US123385322025
Plasma Processing Method and Plasma Processing Apparatus
Tokyo Electron Limited
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US123409772025
Plasma Source and Plasma Processing Apparatus
Tokyo Electron Limited
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US123157002025
Plasma Processing Apparatus and Ceiling Wall
TOKYO ELECTRON LIMITED
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US122834652025
Plasma Processing Apparatus and Plasma Processing Method
Tokyo Electron Limited
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US122610252025
Plasma Processing Apparatus
Tokyo Electron Limited
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US122437182025
Plasma Processing Method and Plasma Processing Apparatus
Tokyo Electron Limited
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US122437162025
Plasma Processing Apparatus
Tokyo Electron Limited
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US122371572025
Plasma Measurement Method
Tokyo Electron Limited
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US122058002025
Plasma Processing Apparatus and Plasma Processing Method
Tokyo Electron Limited
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US121658462024
Plasma Processing Apparatus and Plasma Processing Method
Tokyo Electron Limited
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US120682082024
Plasma Processing Apparatus and Control Method
TOKYO ELECTRON LIMITED
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US120515642024
Shower Plate, Plasma Processing Apparatus and Plasma Processing Method
TOHOKU UNIVERSITY
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US120464552024
Shower Plate, Lower Dielectric Member and Plasma Processing Apparatus
Tokyo Electron Limited
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US120464532024
Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
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US119674852024
Plasma Processing Apparatus and Plasma Processing Method
TOKYO ELECTRON LIMITED
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US119292342024
Plasma Processing Apparatus and Lower Stage
TOHOKU UNIVERSITY
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US119231702024
Plasma Processing Apparatus and Plasma Processing Method
TOKYO ELECTRON LIMITED
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US119086632024
Plasma Processing Apparatus
Tokyo Electron Limited
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US118878252024
Control Method and Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US118512342023
Plastic Container and Method for Producing Same
TOYO ALUMINIUM KABUSHIKI KAISHA
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US118428862023
Plasma Processing Method and Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
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US117840852023
Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US117215282023
Plasma Processing Apparatus and Control Method
TOKYO ELECTRON LIMITED
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US117053102023
Plasma Probe Device, Plasma Processing Apparatus, and Control Method
TOKYO ELECTRON LIMITED
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US116004752023
Plasma Processing Apparatus and Control Method
TOKYO ELECTRON LIMITED
0 cites