Patents/Inventors

Tamotsu Oowada

YokohamaJP1 patent

2 Patents

US122164052025
Photosensitive Resin Composition, Photosensitive Resin Film, Photosensitive Dry Film, Patterning Process, and Light Emitting Device
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites
US116933182023
Photosensitive Resin Composition, Photosensitive Resin Coating, Photosensitive Dry Film, and Black Matrix
Shin-etsu Chemical Co., Ltd.
0 cites