14 Patents
- US124746282025Reflective Mask Blank and Method for Manufacturing Reflective Mask
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - US124079362025Solid State Imaging Element, Imaging Apparatus, and Method for Controlling Solid State Imaging Element
SONY SEMICONDUCTOR SOLUTIONS CORPORATION
0 cites - 0 cites
- US122653212025Reflective Mask Blank, and Method for Manufacturing Reflective Mask
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - 0 cites
- US121971212025Phase Shift Mask Blank, Manufacturing Method of Phase Shift Mask, and Phase Shift Mask
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - US121241622024Substrate with Film for Reflective Mask Blank, Reflective Mask Blank, and Method for Manufacturing Reflective Mask
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - 0 cites
- US120503962024Reflective Mask Blank, Method of Manufacturing Thereof, and Reflective Mask
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - US118605292024Substrate with Multilayer Reflection Film for EUV Mask Blank, Manufacturing Method Thereof, and EUV Mask Blank
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - US118358512023Substrate with Multilayer Reflection Film for EUV Mask Blank, Manufacturing Method Thereof, and EUV Mask Blank
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - US117893572023Method of Manufacturing Reflective Mask Blank, and Reflective Mask Blank
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - US116447422023Phase Shift Mask Blank, Manufacturing Method Thereof, and Phase Shift Mask
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - US116447432023Halftone Phase Shift-type Photomask Blank, Method of Manufacturing Thereof, and Halftone Phase Shift-type Photomask
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites