3 Patents
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- US118529702023Material for Lithography, Production Method Therefor, Composition for Lithography, Pattern Formation Method, Compound, Resin, and Method for Purifying the Compound or the Resin
A School Corporation Kansai University
0 cites - US115724302023Compound, Resin, Resist Composition or Radiation-sensitive Composition, Resist Pattern Formation Method, Method for Producing Amorphous Film, Underlayer Film Forming Material for Lithography, Composition for Underlayer Film Formation for Lithography, Method for Forming Circuit Pattern, and Purification Method
Mitsubishi Gas Chemical Company, Inc.
0 cites