Patents/Inventors

Takashi Sawamura

JoetsuJP16 patents

10 Patents

US126191502026
Material for Forming Organic Film, Substrate for Manufacturing Semiconductor Device, Method for Forming Organic Film, Patterning Process, and Compound for Forming Organic Film
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites
US125884742026
Composition for Forming Protective Film Against Alkaline Aqueous Hydrogen Peroxide, Substrate for Producing Semiconductor Apparatus, Method for Forming Protective Film, and Method for Forming Pattern
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites
US123796612025
Material for Forming Organic Film, Substrate for Manufacturing Semiconductor Device, Method for Forming Organic Film, Patterning Process, and Compound for Forming Organic Film
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites
US118861182024
Material for Forming Organic Film, Substrate for Manufacturing Semiconductor Device, Method for Forming Organic Film, Patterning Process, and Compound for Forming Organic Film
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites
US118515302023
Material for Forming Organic Film, Patterning Process, and Polymer
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites
US117094292023
Composition for Forming Organic Film, Patterning Process, and Polymer
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites
US116920662023
Material for Forming Organic Film, Substrate for Manufacturing Semiconductor Device, Method for Forming Organic Film, Patterning Process, and Compound for Forming Organic Film
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites
US116752682023
Composition for Forming Organic Film, Patterning Process, and Polymer
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites
US116768142023
Material for Forming Organic Film, Substrate for Manufacturing Semiconductor Apparatus, Method for Forming Organic Film, and Patterning Process
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites
US116356912023
Composition for Forming Organic Film, Substrate for Manufacturing Semiconductor Device, Method for Forming Organic Film, Patterning Process, and Polymer
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites